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Imec Reports Breakthrough Results on Directed Self-Assembly at SPIE 2015

Developments pave way to DSA extending 193nm immersion lithography

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By: DAVID SAVASTANO

Editor, Ink World Magazine

At the SPIE advanced lithography conference in San Jose, CA, imec presented breakthrough results on Directed Self-Assembly (DSA) process development. Together with semiconductor equipment supplier Tokyo Electron and Merck, a leading chemical and pharmaceutical company that acquired AZ Electronic Materials in May 2014, imec has significantly improved DSA defectivity in the past year, approaching single-digit values.   Additionally, the partners have developed a DSA solution for a via patterning...

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